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11 June 1999 Approaches to etch-resistant 193-nm photoresists: performance and prospects
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Abstract
We have investigated three substantially different routes to 193nm single layer resists. This paper will attempt to shed light on the strengths and weaknesses of each approach. Design principles, polymer synthesis and properties, and resist properties will be discussed for the three main branches of 193nm resists.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
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