Chemically amplified negative resist optimized for high-resolution x-ray lithography

Jiro Nakamura; Yoshio Kawai; Kimiyoshi Deguchi; Masatoshi Oda; Tadahito Matsuda

doi:10.1117/12.350228

11 June 1999 Chemically amplified negative resist optimized for high-resolution x-ray lithography

Jiro Nakamura; Yoshio Kawai; Kimiyoshi Deguchi; Masatoshi Oda; Tadahito Matsuda

Author Affiliations +

Proceedings Volume 3678, Advances in Resist Technology and Processing XVI; (1999) https://doi.org/10.1117/12.350228
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

We have developed a three-component negative resist for x- ray lithography which is composed of monodispersed polyhydroxystyrene as a base polymer, hexamethoxymethylmelamine as a cross-linker, and alicyclic- bromides containing ketonic groups as an acid generator. To enlarge the contrast of the dissolution rate between the exposed and unexposed films, polyhydroxystyrene was partially protected by t-butoxycarbonyl groups and organic bases were added to the resist component. Among the bromic compounds we evaluated as acid generators, the alicyclic- bromides containing ketonic groups produced hydrobromic acids most efficiently. The resolution of the new resist remains nice down to 80-nm line-and-space patterns at a proximity gap of 20 micrometers , and 70-nm patterns at a gap of 10 micrometers with a resist sensitivity of 150 mJ/cm².

Citation Download Citation

Jiro Nakamura, Jiro Nakamura, Yoshio Kawai, Yoshio Kawai, Kimiyoshi Deguchi, Kimiyoshi Deguchi, Masatoshi Oda, Masatoshi Oda, Tadahito Matsuda, Tadahito Matsuda, } "Chemically amplified negative resist optimized for high-resolution x-ray lithography", Proc. SPIE 3678, Advances in Resist Technology and Processing XVI, (11 June 1999); doi: 10.1117/12.350228; https://doi.org/10.1117/12.350228

ACCESS THE FULL ARTICLE

PERSONAL SIGN IN
Full access may be available with your subscription

Email or Username Forgot your username?

Password Forgot your password?

Show

Remember Email/Username on this computer

Remember Password

No SPIE account? Create an account
or Institutional Sign In via Shibboleth

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $14.40

Non-members: $18.00 ADD TO CART

Show All Keywords

Keywords/Phrases

Search In:

Publication Years