11 June 1999 Effect of cresol monomers in three-component novolak resin on photolithographic performance
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Abstract
In our previous publication we reported an improved process for isolation of novolak resins form phenol-formaldehyde condensation mixtures. The process results in resins having low polydispersity and slow photospeed. Novolak resins were prepared by the same process, employing different ratios of the cresol components. This paper will discuss an experimental design analyzing relationship between cresol component ratios and properties of the resins. The characteristics of the resins and their effect on the lithographic performances as an i-line photoresist composition will also be discussed.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Woo-Kyu Kim, Woo-Kyu Kim, M. Dalil Rahman, M. Dalil Rahman, Stanley A. Ficner, Stanley A. Ficner, Dinesh N. Khanna, Dinesh N. Khanna, } "Effect of cresol monomers in three-component novolak resin on photolithographic performance", Proc. SPIE 3678, Advances in Resist Technology and Processing XVI, (11 June 1999); doi: 10.1117/12.350171; https://doi.org/10.1117/12.350171
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