11 June 1999 Important role of hydroxyethyl derivatives of poly(hydroxystyrene) in the development of advanced negative resists
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Abstract
In this paper, we present the synthesis, thermal properties, dissolution characteristics and lithographic potential of a new poly(hydroxystyrene) derivative (PHS-EtOH) obtained by blocking the phenolic functionality with a saturated alcohol moiety through an ether linkage. The replacement of PHS with this modified polymer in a negative resist formulation has resulted in a dramatic improvement in dense line resolution.
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Pushkara Rao Varanasi, Pushkara Rao Varanasi, Niranjan Patel, Niranjan Patel, } "Important role of hydroxyethyl derivatives of poly(hydroxystyrene) in the development of advanced negative resists", Proc. SPIE 3678, Advances in Resist Technology and Processing XVI, (11 June 1999); doi: 10.1117/12.350177; https://doi.org/10.1117/12.350177
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