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11 June 1999 Lithographic properties of novel acetal-derivatized hydroxy styrene polymers
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Lithographic properties of a variety of acetal-derivatized styrene based polymers are reported. The structural modifications in the polymers involve varying the size of the pendent acetal moiety. the lithographic performances of the resists containing structurally modified acetals were found to be superior to the conventional acetals. In the cases where the acidolysis products of the modified acetals are non-volatile alcohols, the post-exposure volatilization, film shrinkage and plasma etch resistance were found to be significantly improved.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Sanjay Malik, Andrew J. Blakeney, Lawrence Ferreira, Brian Maxwell, Allyn Whewell, Thomas R. Sarubbi, Murrae J. Bowden, Veerle Van Driessche, Toru Fujimori, Shiro Tan, Toshiaki Aoai, Kazuya Uenishi, Yasumasa Kawabe, and Tadayoshi Kokubo "Lithographic properties of novel acetal-derivatized hydroxy styrene polymers", Proc. SPIE 3678, Advances in Resist Technology and Processing XVI, (11 June 1999);

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