11 June 1999 Lithographic properties of novel acetal-derivatized hydroxy styrene polymers
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Lithographic properties of a variety of acetal-derivatized styrene based polymers are reported. The structural modifications in the polymers involve varying the size of the pendent acetal moiety. the lithographic performances of the resists containing structurally modified acetals were found to be superior to the conventional acetals. In the cases where the acidolysis products of the modified acetals are non-volatile alcohols, the post-exposure volatilization, film shrinkage and plasma etch resistance were found to be significantly improved.
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Sanjay Malik, Sanjay Malik, Andrew J. Blakeney, Andrew J. Blakeney, Lawrence Ferreira, Lawrence Ferreira, Brian Maxwell, Brian Maxwell, Allyn Whewell, Allyn Whewell, Thomas R. Sarubbi, Thomas R. Sarubbi, Murrae J. Bowden, Murrae J. Bowden, Veerle Van Driessche, Veerle Van Driessche, Toru Fujimori, Toru Fujimori, Shiro Tan, Shiro Tan, Toshiaki Aoai, Toshiaki Aoai, Kazuya Uenishi, Kazuya Uenishi, Yasumasa Kawabe, Yasumasa Kawabe, Tadayoshi Kokubo, Tadayoshi Kokubo, } "Lithographic properties of novel acetal-derivatized hydroxy styrene polymers", Proc. SPIE 3678, Advances in Resist Technology and Processing XVI, (11 June 1999); doi: 10.1117/12.350222; https://doi.org/10.1117/12.350222

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