11 June 1999 Methacrylate resists and antireflective coatings for 193-nm lithography
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Methacrylates were the first class of resist to be examined for use in 193nm lithography. They are still useful today, but have a very different molecular structure because of the requirements for development in 0.262N tetramethyl ammonium hydroxide and high etching resistance. A major driving force for their continued use is the availability of a wide variety of methacrylate monomers and the use of free racial polymerization which imparts a wide range of properties to the polymers and makes them very cost effective.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Gary N. Taylor, Gary N. Taylor, Peter Trefonas, Peter Trefonas, Charles R. Szmanda, Charles R. Szmanda, George G. Barclay, George G. Barclay, Robert J. Kavanagh, Robert J. Kavanagh, Robert F. Blacksmith, Robert F. Blacksmith, Lori Anne Joesten, Lori Anne Joesten, Michael J. Monaghan, Michael J. Monaghan, Suzanne Coley, Suzanne Coley, Zhibiao Mao, Zhibiao Mao, James F. Cameron, James F. Cameron, Ricky Hardy, Ricky Hardy, Dana Gronbeck, Dana Gronbeck, S. Connolly, S. Connolly, "Methacrylate resists and antireflective coatings for 193-nm lithography", Proc. SPIE 3678, Advances in Resist Technology and Processing XVI, (11 June 1999); doi: 10.1117/12.350199; https://doi.org/10.1117/12.350199

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