Paper
11 June 1999 New photoresist stripper and a system for recycling it
Hideki Nishida, Hiroshi Kikuchi, Kensuke Yano, Hiroyasu Matsuda
Author Affiliations +
Abstract
Although it is hard to strip away the photoresist layer damaged during the etching process in manufacturing liquid crystal display devices, monoethynoloamine (MEA) was found to have excellent photoresist stripping characteristics. Crosslinked novolak resin is easily dissolved in a MEA solution because MEA has a large cohesive energy, a strong affinity for novolak, and a small molecular weight. Pure MEA can be recycled with high yield by using a simple system that has short multiple-pipe distillation columns that have high heat-transfer efficiency. The pipes in our distillation system are made of 304 stainless steel because this material was found to resist corrosion in an aqueous MEA solution better than 316L stainless or Cu. This recycling system has been operating in production lines for more than two years without showing any signs of trouble.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hideki Nishida, Hiroshi Kikuchi, Kensuke Yano, and Hiroyasu Matsuda "New photoresist stripper and a system for recycling it", Proc. SPIE 3678, Advances in Resist Technology and Processing XVI, (11 June 1999); https://doi.org/10.1117/12.350252
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CITATIONS
Cited by 2 scholarly publications.
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KEYWORDS
Photoresist materials

Corrosion

Etching

Manufacturing

Copper

LCDs

Ultraviolet radiation

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