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11 June 1999 Novel 193-nm single-layer resist containing a multifunctional monomer
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Abstract
We have newly developed a novel multi-functional monomer. Application of this monomer also allows us to introduce another unit to further improve its etch resistance. Furthermore, our novel resist containing this multi- functional monomer exhibits an excellent adhesion to Si substrate, an improved CD linearity, a high sensitivity, a good contrast, and a high synthetic yield. A 110nm L/S pattern was successfully at 1:2 pitch of a strong PSM was also successfully obtained by using a 2.38wt percent TMAH aqueous solution as a developer.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Geunsu Lee, Cha-Won Koh, Jae Chang Jung, Min-Ho Jung, Hyeong-Soo Kim, Ki-Ho Baik, and Il-Hyun Choi "Novel 193-nm single-layer resist containing a multifunctional monomer", Proc. SPIE 3678, Advances in Resist Technology and Processing XVI, (11 June 1999); https://doi.org/10.1117/12.350206
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