Optimization of the lithographic performance for lift-off processing

Wenyan Yin; Ward Fillmore; Kevin J. Dempsey

doi:10.1117/12.350258

11 June 1999 Optimization of the lithographic performance for lift-off processing

Wenyan Yin, Ward Fillmore, Kevin J. Dempsey

Proceedings Volume 3678, Advances in Resist Technology and Processing XVI; (1999) https://doi.org/10.1117/12.350258
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

Shipley MICROPOSIT LOL lift-off technology exploits a develop rate difference in a resist, LOL1000 bi-layer system to generate retrograde profiles. This is an enabling technology for 'additive' processing. Deposition follows lithography and the resist is then 'lifted off' to generate a patterned layer.

Citation Download Citation

Wenyan Yin, Ward Fillmore, and Kevin J. Dempsey "Optimization of the lithographic performance for lift-off processing", Proc. SPIE 3678, Advances in Resist Technology and Processing XVI, (11 June 1999); https://doi.org/10.1117/12.350258

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available