11 June 1999 Photoresist silylation and "swelling": simulation using finite element analysis and physical boundary movement algorithms
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Abstract
In this work, a new resist silylation simulator called STIL has been developed. This simulator models the silylation process as a 1D Initial Boundary Value problem which is then solved using in-house developed Finite Element Analysis code. In this model, the silylating agent diffusion and reaction rates are recalculate dafter each silylating time- step, (delta) t. The swelling mechanism is modeled as a Boundary Movement problem whereby the swelling in each element is a function of the local silicon concentration in that element. By solution of this system across the exposed area, a 2D profile of the silicon concentration is determined over an exposed linewidth. the simulations from this model are compared to published experimental data.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Arousian Arshak, Arousian Arshak, Thomas J. Kinsella, Thomas J. Kinsella, Declan McDonagh, Declan McDonagh, } "Photoresist silylation and "swelling": simulation using finite element analysis and physical boundary movement algorithms", Proc. SPIE 3678, Advances in Resist Technology and Processing XVI, (11 June 1999); doi: 10.1117/12.350229; https://doi.org/10.1117/12.350229
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