Polymer-platform-dependent characteristics of 193-nm photoresists

Juliann Opitz; Robert D. Allen; Gregory Breyta; Donald C. Hofer; Narayan Sundararajan; Christopher Kemper Ober

doi:10.1117/12.350161

11 June 1999 Polymer-platform-dependent characteristics of 193-nm photoresists

Juliann Opitz, Robert D. Allen, Gregory Breyta, Donald C. Hofer, Narayan Sundararajan, Christopher Kemper Ober

Proceedings Volume 3678, Advances in Resist Technology and Processing XVI; (1999) https://doi.org/10.1117/12.350161
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

The development and refinement of 193 nm single layer photoresist has continued to progress at a quick pace. Published resists efforts have historically been partitioned by polymer family: acrylic, addition cyclic olefin, and alternating cyclic olefin/maleic anhydride. The polymer platforms for 193 nm resists have been a radical departure from 248 nm resists, therefore, publications to date have largely focused on the attributes of each specific variety. Since the physical and chemical properties of the aforementioned polymer platforms are very different, it would follow that, in principal, typical formulation strategies should produce varying results in each platform. This paper investigates the effects of three typical photoacid generators and three model polymers on various aspects of lithographic evaluation.

Citation Download Citation

Juliann Opitz, Robert D. Allen, Gregory Breyta, Donald C. Hofer, Narayan Sundararajan, and Christopher Kemper Ober "Polymer-platform-dependent characteristics of 193-nm photoresists", Proc. SPIE 3678, Advances in Resist Technology and Processing XVI, (11 June 1999); https://doi.org/10.1117/12.350161

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