Simple method for measuring acid generation quantum efficiency at 193 nm

Charles R. Szmanda; Robert J. Kavanagh; John F. Bohland; James F. Cameron; Peter Trefonas III; Robert F. Blacksmith

doi:10.1117/12.350274

11 June 1999 Simple method for measuring acid generation quantum efficiency at 193 nm

Charles R. Szmanda, Robert J. Kavanagh, John F. Bohland, James F. Cameron, Peter Trefonas III, Robert F. Blacksmith

Proceedings Volume 3678, Advances in Resist Technology and Processing XVI; (1999) https://doi.org/10.1117/12.350274
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

Traditional methods of measuring the Dill C Parameter involve monitoring the absorbance of a resist as a function of exposure. In chemically amplified resist, absorbance changes with exposure are small and frequently have little correlation to the amount of photoacid generated.

Citation Download Citation

Charles R. Szmanda, Robert J. Kavanagh, John F. Bohland, James F. Cameron, Peter Trefonas III, and Robert F. Blacksmith "Simple method for measuring acid generation quantum efficiency at 193 nm", Proc. SPIE 3678, Advances in Resist Technology and Processing XVI, (11 June 1999); https://doi.org/10.1117/12.350274

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