11 June 1999 Simple method for measuring acid generation quantum efficiency at 193 nm
Author Affiliations +
Abstract
Traditional methods of measuring the Dill C Parameter involve monitoring the absorbance of a resist as a function of exposure. In chemically amplified resist, absorbance changes with exposure are small and frequently have little correlation to the amount of photoacid generated.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Charles R. Szmanda, Charles R. Szmanda, Robert J. Kavanagh, Robert J. Kavanagh, John F. Bohland, John F. Bohland, James F. Cameron, James F. Cameron, Peter Trefonas, Peter Trefonas, Robert F. Blacksmith, Robert F. Blacksmith, } "Simple method for measuring acid generation quantum efficiency at 193 nm", Proc. SPIE 3678, Advances in Resist Technology and Processing XVI, (11 June 1999); doi: 10.1117/12.350274; https://doi.org/10.1117/12.350274
PROCEEDINGS
10 PAGES


SHARE
Back to Top