Application of a new approach to optical proximity correction

Anja Rosenbusch; Andrew C. Hourd; Casper A. H. Juffermans; Hartmut Kirsch; Frederic P. Lalanne; Wilhelm Maurer; Carmelo Romeo; Kurt G. Ronse; Patrick Schiavone; Michal Simecek; Olivier Toublan; Tom Vermeulen; John G. Watson; Wolfram Ziegler; Rainer Zimmermann

doi:10.1117/12.354378

26 July 1999 Application of a new approach to optical proximity correction

Anja Rosenbusch, Andrew C. Hourd, Casper A. H. Juffermans, Hartmut Kirsch, Frederic P. Lalanne, Wilhelm Maurer, Carmelo Romeo, Kurt G. Ronse, Patrick Schiavone, Michal Simecek, Olivier Toublan, Tom Vermeulen, John G. Watson, Wolfram Ziegler, Rainer Zimmermann

Author Affiliations +

Proceedings Volume 3679, Optical Microlithography XII; (1999) https://doi.org/10.1117/12.354378
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

Optical proximity correction is one of the major hurdles chip manufacturing has to overcome. The paper presents evaluation results of CAPROX OPC, a rule based OPC software. Mask making influences as well as production requirements are discussed. Rule generation, one of the most critical parts in a rule based correction scheme is discussed. Two different applications are presented.

Citation Download Citation

Anja Rosenbusch, Andrew C. Hourd, Casper A. H. Juffermans, Hartmut Kirsch, Frederic P. Lalanne, Wilhelm Maurer, Carmelo Romeo, Kurt G. Ronse, Patrick Schiavone, Michal Simecek, Olivier Toublan, Tom Vermeulen, John G. Watson, Wolfram Ziegler, and Rainer Zimmermann "Application of a new approach to optical proximity correction", Proc. SPIE 3679, Optical Microlithography XII, (26 July 1999); https://doi.org/10.1117/12.354378

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