Automatic parallel optical proximity correction system for application with hierarchical data structure

Eiji Tsujimoto; Takahiro Watanabe; Kyoji Nakajo

doi:10.1117/12.354382

26 July 1999 Automatic parallel optical proximity correction system for application with hierarchical data structure

Eiji Tsujimoto, Takahiro Watanabe, Kyoji Nakajo

Proceedings Volume 3679, Optical Microlithography XII; (1999) https://doi.org/10.1117/12.354382
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

To enable very fast OPC, we have developed an automatic parallel-processing optical proximity correction system named Acropolis using a rule-based approach for very large scale layout data. Acropolis can easily handle giga-byte order layout data using parallel processing while preserving data hierarchy as much as possible. This system is also linked to a layout editor through an added-on menu, so that the designer can perform layout considering both original and OPC'ed mask data. In this paper, we describe the evaluation results of Acropolis.

Citation Download Citation

Eiji Tsujimoto, Takahiro Watanabe, and Kyoji Nakajo "Automatic parallel optical proximity correction system for application with hierarchical data structure", Proc. SPIE 3679, Optical Microlithography XII, (26 July 1999); https://doi.org/10.1117/12.354382

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