26 July 1999 Automatic parallel optical proximity correction system for application with hierarchical data structure
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Abstract
To enable very fast OPC, we have developed an automatic parallel-processing optical proximity correction system named Acropolis using a rule-based approach for very large scale layout data. Acropolis can easily handle giga-byte order layout data using parallel processing while preserving data hierarchy as much as possible. This system is also linked to a layout editor through an added-on menu, so that the designer can perform layout considering both original and OPC'ed mask data. In this paper, we describe the evaluation results of Acropolis.
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Eiji Tsujimoto, Takahiro Watanabe, Kyoji Nakajo, "Automatic parallel optical proximity correction system for application with hierarchical data structure", Proc. SPIE 3679, Optical Microlithography XII, (26 July 1999); doi: 10.1117/12.354382; https://doi.org/10.1117/12.354382
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