Translator Disclaimer
26 July 1999 Design of illumination aperture for ArF exposure system with wide exposing latitude
Author Affiliations +
Abstract
We report on the optimum design of illumination aperture with high throughput on ArF exposure system. The quadrupole illumination in the modified illumination methods has a problem to decrease throughput due to the shortage of transmission light passing the pole of the aperture comparing with the conventional illumination. In this paper, we suggest the new quadrupole structure to define 0.15micrometers line and space patterns with high throughput on the ArF exposure system with 0.55 NA.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Sang-Soo Choi, Han-Sun Cha, Jong-Soo Kim, Kag Hyeon Lee, Dohoon Kim, Hai Bin Chung, and Dae Yong Kim "Design of illumination aperture for ArF exposure system with wide exposing latitude", Proc. SPIE 3679, Optical Microlithography XII, (26 July 1999); https://doi.org/10.1117/12.354397
PROCEEDINGS
8 PAGES


SHARE
Advertisement
Advertisement
Back to Top