Effect of exposure tool illumination settings and objective numerical aperture on the standing wave period within photoresist

Stewart A. Robertson; Frank T.G.M. Linskens; Charles R. Szmanda; Kevin J. Dempsey

doi:10.1117/12.354301

26 July 1999 Effect of exposure tool illumination settings and objective numerical aperture on the standing wave period within photoresist

Stewart A. Robertson; Frank T.G.M. Linskens; Charles R. Szmanda; Kevin J. Dempsey

Author Affiliations +

Proceedings Volume 3679, Optical Microlithography XII; (1999) https://doi.org/10.1117/12.354301
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

During the exposure of photoresist, standing waves form within the film, modulating the intensity of the illumination with depth in a sinusoidal fashion. Significant changes in the standing wave period are observed when the exposure tool numerical and illumination settings are altered. These changes are explained and demonstrated by means of both experimentation and lithography simulation for conventional and annular illumination. A function is derived which fully characterizes standing wave extrema separation in terms of numerical aperture and partial coherent for conventional illumination. It is shown that when extrema separation is normalized by a factor of (lambda) /4n that the resulting function is independent of (lambda) and exposure tool magnification ratio, but is sensitive to changes in n. Although not fully characterized, the effect of annular illumination on extrema separation is explored and some key aspects of the behavior are identified.

Citation Download Citation

Stewart A. Robertson, Stewart A. Robertson, Frank T.G.M. Linskens, Frank T.G.M. Linskens, Charles R. Szmanda, Charles R. Szmanda, Kevin J. Dempsey, Kevin J. Dempsey, } "Effect of exposure tool illumination settings and objective numerical aperture on the standing wave period within photoresist", Proc. SPIE 3679, Optical Microlithography XII, (26 July 1999); doi: 10.1117/12.354301; https://doi.org/10.1117/12.354301

ACCESS THE FULL ARTICLE

PERSONAL SIGN IN
Full access may be available with your subscription

Email or Username Forgot your username?

Password Forgot your password?

Show

Remember Email/Username on this computer

Remember Password

No SPIE account? Create an account
or Institutional Sign In via Shibboleth

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $14.40

Non-members: $18.00 ADD TO CART

Show All Keywords

Keywords/Phrases

Search In:

Publication Years