Impact of pellicle damage on patterning characteristics in ArF lithography

Junji Miyazaki; Masaya Uematsu; Tohru Ogawa

doi:10.1117/12.354364

26 July 1999 Impact of pellicle damage on patterning characteristics in ArF lithography

Junji Miyazaki, Masaya Uematsu, Tohru Ogawa

Proceedings Volume 3679, Optical Microlithography XII; (1999) https://doi.org/10.1117/12.354364
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

Pellicle durability and the effect of damaged pellicles on lithographic performance were investigated. It was found that pellicles lose their thickness but do not change their optical constant in an air atmosphere when irradiated by an ArF laser. Changes in pellicle thickness cause a wave aberration change. It was confirmed that this damage affects lithographic performance in simulations and experiments. It was estimated that transmittance of a 1 percent change causes a CD shift of 0.6 nm. We have also found that a lifetime of latest pellicle is over one year. Pellicles are now available with enough durability, as the pellicle durability has been greatly improved.

Citation Download Citation

Junji Miyazaki, Masaya Uematsu, and Tohru Ogawa "Impact of pellicle damage on patterning characteristics in ArF lithography", Proc. SPIE 3679, Optical Microlithography XII, (26 July 1999); https://doi.org/10.1117/12.354364

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