26 July 1999 Integration of alternating phase-shift mask technology into optical proximity correction
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Abstract
The paper describes the extension of optical proximity correction (OPC), which is well established for conventional chromium-on-glass mask printing, to alternating phase shift masks (altPSM). Aerial image simulation of various situations of light-field and dark-field altPSM shows that the size of the phase shifter has a great impact on the printed critical dimension (CD). Especially layouts containing non-symmetric phase shifters or shifter sizes comparable to the nominal CD do not print on target. The application of optical proximity correction to the chromium structures between the phase shifters is capable to compensate for such effects. We demonstrate the added value of OPC using a simulation-based software tool for altPSM.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Joerg Thiele, Joerg Thiele, Christoph M. Friedrich, Christoph M. Friedrich, Christoph Dolainsky, Christoph Dolainsky, Paul Karakatsanis, Paul Karakatsanis, Wilhelm Maurer, Wilhelm Maurer, } "Integration of alternating phase-shift mask technology into optical proximity correction", Proc. SPIE 3679, Optical Microlithography XII, (26 July 1999); doi: 10.1117/12.354367; https://doi.org/10.1117/12.354367
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