26 July 1999 Novel aberration monitor for optical lithography
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Abstract
The aberration monitor allows independent determination of spherical, coma, astigmatism and three point in a single experiment using existing equipment. The monitor consists of a circular phase object, with a diameter of approximately (lambda) /NA and a phase depth of (lambda) /2. Due to the relative large diameter, the image prints as a narrow ring into the resist. Without aberrations its contours are concentric circles. Aberrations deform the ring in a characteristic way. A detailed analysis of the ring shape through focus identifies the aberrations of the projection lens. A linear aberration model is compared with simulations. Experimental results of various aberrations are shown and ar correlated to line width measurements and interferometric lens data.
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Peter Dirksen, Casper A. H. Juffermans, Rudy J. M. Pellens, Mireille Maenhoudt, Peter De Bisschop, "Novel aberration monitor for optical lithography", Proc. SPIE 3679, Optical Microlithography XII, (26 July 1999); doi: 10.1117/12.354385; https://doi.org/10.1117/12.354385
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