Performance of the ArF scanning exposure tool

Susumu Mori

doi:10.1117/12.354363

26 July 1999 Performance of the ArF scanning exposure tool

Susumu Mori

Proceedings Volume 3679, Optical Microlithography XII; (1999) https://doi.org/10.1117/12.354363
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

The 193nm lithography is needed for manufacturing devices of finer than 180nm feature size rule. The each key technology in regard to 193nm wavelength, the light source, glass material, photo resist, mask, and so on, has been investigated until now. For ArF exposure too, the major concerns of 193nm wavelength are the projection unit and the illumination unit. The glass materials have been tested the quality and durability for exposure tools' life. Using enough good materials, the first solution of full field ArF projection lens was accomplished by all refractive type, and its performance was confirmed.

Citation Download Citation

Susumu Mori "Performance of the ArF scanning exposure tool", Proc. SPIE 3679, Optical Microlithography XII, (26 July 1999); https://doi.org/10.1117/12.354363

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