26 July 1999 Production-ready 2-kHz KrF excimer laser for DUV lithography
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Abstract
Now that 1000 Hz KrF excimer laser based DUV lithography tools are firmly established in production, emphasis is shifting from development towards improving the productivity and profitability of the manufacturing process, thereby reducing the cost per wafer. In this arena, laser manufacturers are competing now not only on performance but also on cost and productivity enhancements that the laser can offer to the lithography process.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Dave Myers, Tom A. Watson, Palash P. Das, Gunasiri G. Padmabandu, Paolo Zambon, Thomas Hofmann, William N. Partlo, Christopher Hysham, Richard Dunning, "Production-ready 2-kHz KrF excimer laser for DUV lithography", Proc. SPIE 3679, Optical Microlithography XII, (26 July 1999); doi: 10.1117/12.354309; https://doi.org/10.1117/12.354309
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