26 July 1999 Synergistic evolution to production-worthy 30-nm lithography
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The ever-increasing demand on circuit performance necessitates rapid deployment of optical lithographic as well as early production next generation lithographic tools. Successful execution of the multitude of development programs involved requires careful consideration and implementation of system architecture with special emphasis on program synergy and modularity. This paper presents performance data and system budgeting and allocation for current generation lithographic tools, and building from that basis, discusses evolutionary approaches for critical performance areas and modules. Supporting analytical results regarding performance of these modules are also discussed.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Daniel R. Cote, James A. McClay, Noreen Harned, "Synergistic evolution to production-worthy 30-nm lithography", Proc. SPIE 3679, Optical Microlithography XII, (26 July 1999); doi: 10.1117/12.354325; https://doi.org/10.1117/12.354325

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