Variations to the influence of lens aberration invoked with PSM and OAI

Bruce W. Smith

doi:10.1117/12.354346

26 July 1999 Variations to the influence of lens aberration invoked with PSM and OAI

Bruce W. Smith

Proceedings Volume 3679, Optical Microlithography XII; (1999) https://doi.org/10.1117/12.354346
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

Through use of shorter wavelengths, larger numerical aperture lenses and resolution enhancement techniques optical extension may allow for attainment of geometry as small as 50 nm. As these trends continue, an appreciation of the influence that lens aberration has on imaging is required. Additionally, a fundamental understanding of the impact of various imaging approaches on aberration is needed. In this paper, we describe methods of interpretation that can lead to optimization of an imaging system under the influence of aberration where off-axis illumination or phase shift masking is utilized.

Citation Download Citation

Bruce W. Smith "Variations to the influence of lens aberration invoked with PSM and OAI", Proc. SPIE 3679, Optical Microlithography XII, (26 July 1999); https://doi.org/10.1117/12.354346

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