26 July 1999 Watt-level DUV generation by solid state laser for lithography
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The first all-solid-state laser system generating 1 W of 196 nm light at a 5-kHz pulse-repetition rate has been developed. The laser system consists of a Neodymium:Yttrium Lithium Fluoride maser oscillator power amplifier operating at 5 kHz, a single-frequency, gain-switched Titanium:sapphire laser, and additional frequency conversion stages utilizing nonlinear crystal such as Cesium Lithium Borate grown by USHIO and Lithium Triborate. The performance of each system component will discussed as well as the novel pathway employed to reach 196 nm.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yasu Ohsako, Yasu Ohsako, Jun Sakuma, Jun Sakuma, Andrew Finch, Andrew Finch, Kyoichi Deki, Kyoichi Deki, Masahiro Horiguchi, Masahiro Horiguchi, Toshio Yokota, Toshio Yokota, } "Watt-level DUV generation by solid state laser for lithography", Proc. SPIE 3679, Optical Microlithography XII, (26 July 1999); doi: 10.1117/12.354361; https://doi.org/10.1117/12.354361


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