10 March 1999 Fabrication of multi-air gap InP-based microstructures for widely tunable optical filters
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Proceedings Volume 3680, Design, Test, and Microfabrication of MEMS and MOEMS; (1999) https://doi.org/10.1117/12.341253
Event: Design, Test, and Microfabrication of MEMS/MOEMS, 1999, Paris, France
Abstract
InP-based microstructuring optimization is presented in order to develop the fabrication of highly selective and widely tunable optical filter for WDM applications. Technological constraints such as etching selectivity, etching anisotropy, sticking phenomena and residual stress are listed and their respective practical solutions are demonstrated. Opto-electro-mechanical simulations combined with this technological 'know how' have yielded to the fabrication of 8 air gaps InP-based microstructures suitable for production of optical filter demonstrators.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Alain Spisser, Alain Spisser, Philippe Regreny, Philippe Regreny, Christian Seassal, Christian Seassal, Jean Louis Leclercq, Jean Louis Leclercq, Pierre Viktorovitch, Pierre Viktorovitch, } "Fabrication of multi-air gap InP-based microstructures for widely tunable optical filters", Proc. SPIE 3680, Design, Test, and Microfabrication of MEMS and MOEMS, (10 March 1999); doi: 10.1117/12.341253; https://doi.org/10.1117/12.341253
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