10 March 1999 Microstereolithography using a dynamic mask generator and a noncoherent visible light source
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Proceedings Volume 3680, Design, Test, and Microfabrication of MEMS and MOEMS; (1999) https://doi.org/10.1117/12.341246
Event: Design, Test, and Microfabrication of MEMS/MOEMS, 1999, Paris, France
Abstract
Laser stereolithography deals with the manufacture of 3D objects that are made by space-resolved laser-induced polymerization. In order to obtain 3D micro-objects, we developed a new microstereolithography apparatus based on the use of a dynamic mask generator which allows the manufacture of a complete layer by only one irradiation, the part being manufactured layer by layer. This process is compared of a broad-band visible light source, that leads to the elimination of speckle effects resulting from the conventional use of a laser beam, and of a liquid crystal display as the dynamic mask generator. A lateral resolution of 2 micrometers has been demonstrated, and some examples of high aspect ratio micro-objects are presented.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Serge Monneret, Serge Monneret, Virginie Loubere, Virginie Loubere, Serge Corbel, Serge Corbel, } "Microstereolithography using a dynamic mask generator and a noncoherent visible light source", Proc. SPIE 3680, Design, Test, and Microfabrication of MEMS and MOEMS, (10 March 1999); doi: 10.1117/12.341246; https://doi.org/10.1117/12.341246
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