10 March 1999 New method to design halftone mask for the fabrication of continuous microrelief structure
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Proceedings Volume 3680, Design, Test, and Microfabrication of MEMS and MOEMS; (1999); doi: 10.1117/12.341286
Event: Design, Test, and Microfabrication of MEMS/MOEMS, 1999, Paris, France
Abstract
A new method is proposed to design gray-tone masks for fabrication of surface relief microstructures. Unlike previous methods which modulate the light intensity by changing the cell size or cell pitch only, the method relays on adjusting both the shape and position of a cell which gives an extra freedom to control the design accuracy. Using the new method a gray-tone mask has been designed to produce a hemispherical shape relief structure. Based on the theory of partial coherent light and the resist development model, the intensity distribution through the gray-tone mask and exposure of photoresist have been simulated. Nonlinear effects in aerial image and resist development have been taken into account to correct the mask design. The accuracy of the gray-tone mask design has been confirmed by simulation of 3D resist profiles.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jingqin Su, Jinglei Du, Jun Yao, Fuhua Gao, Yongkang Guo, Zheng Cui, "New method to design halftone mask for the fabrication of continuous microrelief structure", Proc. SPIE 3680, Design, Test, and Microfabrication of MEMS and MOEMS, (10 March 1999); doi: 10.1117/12.341286; https://doi.org/10.1117/12.341286
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KEYWORDS
Photomasks

Modulation

Photoresist developing

Image processing

Optical lithography

3D modeling

Computer simulations

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