Silicon hillocks elimination using a complexant redox alkaline system

Carmen Moldovan; Rodica Iosub; Dan C. Dascalu; Gheorghe Nechifor; Cornelia-Carmen Danila

doi:10.1117/12.341176

10 March 1999 Silicon hillocks elimination using a complexant redox alkaline system

Carmen Moldovan, Rodica Iosub, Dan C. Dascalu, Gheorghe Nechifor, Cornelia-Carmen Danila

Proceedings Volume 3680, Design, Test, and Microfabrication of MEMS and MOEMS; (1999) https://doi.org/10.1117/12.341176
Event: Design, Test, and Microfabrication of MEMS/MOEMS, 1999, Paris, France

Abstract

This paper present the results from the investigation of the chemical anisotropic etching of single-crystal silicon in the following solutions: KOH, K₃[Fe(CN)₆] 0.1M, K₄[Fe(CH)₆] 3H₂O 0.1M, KNO₃ 0.1M and/or complexant added. The complexants added in KOH solution were: Calix(4)arenes, Phenols and Ether Dibenzo 18 Crown 6. The result using also NaOH or LiOH H₂O and complexants are presented. The reaction mechanism and the hillocks formation and elimination are analyzed. The results allow us to use the redox system and/or the organic complexants, to monitor the etching process, to obtain a smooth silicon surface, almost free of hillocks, to utilize the usual mask material resistant at the new etchants.

Citation Download Citation

Carmen Moldovan, Rodica Iosub, Dan C. Dascalu, Gheorghe Nechifor, and Cornelia-Carmen Danila "Silicon hillocks elimination using a complexant redox alkaline system", Proc. SPIE 3680, Design, Test, and Microfabrication of MEMS and MOEMS, (10 March 1999); https://doi.org/10.1117/12.341176

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