Computer simulation of diffusion processes in microelectronics: approach to the solution of statistical problems

Vladislav V. Nelayev; Maxim V. Kazitov; Sergey I. Vatlin; Aljvina M. Voronkovskaya; Antonina M. Semenkova

doi:10.1117/12.347449

5 May 1999 Computer simulation of diffusion processes in microelectronics: approach to the solution of statistical problems

Vladislav V. Nelayev, Maxim V. Kazitov, Sergey I. Vatlin, Aljvina M. Voronkovskaya, Antonina M. Semenkova

Author Affiliations +

Proceedings Volume 3687, International Workshop on Nondestructive Testing and Computer Simulations in Science and Engineering; (1999) https://doi.org/10.1117/12.347449
Event: International Workshop on Nondestructive Testing and Computer Simulations in Science and Engineering, 1998, St. Petersburg, Russian Federation

Abstract

Many-dimensional technology simulation in microelectronics is the extremely actual problem. Here it is important to know how random fluctuations of the technological parameters affect on the impurity concentration profiles. We used the pattern recognition method as one of the effective tool for the solution of this problem. Expert analysis system as an effective tool for numerical calculation database processing is discussed.

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Vladislav V. Nelayev, Maxim V. Kazitov, Sergey I. Vatlin, Aljvina M. Voronkovskaya, and Antonina M. Semenkova "Computer simulation of diffusion processes in microelectronics: approach to the solution of statistical problems", Proc. SPIE 3687, International Workshop on Nondestructive Testing and Computer Simulations in Science and Engineering, (5 May 1999); https://doi.org/10.1117/12.347449

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