Paper
20 January 1999 Cross-beam pulsed laser deposition of ultrathin multilayer metal films
Andre A. Gorbunov, A. Tselev, Wolfgang Pompe
Author Affiliations +
Proceedings Volume 3688, 6th International Conference on Industrial Lasers and Laser Applications '98; (1999) https://doi.org/10.1117/12.337535
Event: 6th International Conference on Industrial Lasers and Laser Applications '98, 1998, Shatura, Moscow Region, Russian Federation
Abstract
High efficiency of material usage accompanied with reliable droplets filtering is demonstrated in the cross-beam pulsed laser deposition of nm-period metallic multilayers. The mean and maximum kinetic energies of ions in CBLD have proved to be 2-3 times lower as compared to the conventional PLD. Ballistic simulations of the resulting transition layer thickness in nm-period metallic multilayers are presented.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Andre A. Gorbunov, A. Tselev, and Wolfgang Pompe "Cross-beam pulsed laser deposition of ultrathin multilayer metal films", Proc. SPIE 3688, 6th International Conference on Industrial Lasers and Laser Applications '98, (20 January 1999); https://doi.org/10.1117/12.337535
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Cited by 8 scholarly publications.
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KEYWORDS
Plasma

Ions

Multilayers

Particles

Pulsed laser deposition

Ionization

Sputter deposition

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