29 April 1999 Simulation and optimization of holographically exposed photoresist gratings
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Proceedings Volume 3729, Selected Papers from International Conference on Optics and Optoelectronics '98; (1999) https://doi.org/10.1117/12.346788
Event: Selected Papers from the International Conference on Optics and Optoelectronics, 1998, Dehradun, India
Abstract
Standard approaches of lithographic process simulation have been applied to the simulation of holographically exposed photoresist gratings. Fine tuning of the photoresist development parameters results in a good agreement of simulated and experimentally obtained photoresist profiles. Several conclusions with respect to the optimization of process and photoresist parameters for the fabrication of user defined photoresist profiles are drawn.
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Ch. Zanke, Ch. Zanke, Andreas Gombert, Andreas Gombert, Andreas Erdmann, Andreas Erdmann, M. Weiss, M. Weiss, } "Simulation and optimization of holographically exposed photoresist gratings", Proc. SPIE 3729, Selected Papers from International Conference on Optics and Optoelectronics '98, (29 April 1999); doi: 10.1117/12.346788; https://doi.org/10.1117/12.346788
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