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7 September 1999 Broadband antireflection coatings deposited with ion-assisted evaporation
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Abstract
SiO2, Ta2O5 and MgF2 have been deposited by electron beam evaporation under bombardment of ions generated by three different ion or plasma sources. Multilayer systems containing 5 to 12 layers have been designed and realized. The maximum reflectance R of a glass/air interface can be reduced down to R < 0.5 percent in a spectral region of 400 nm to 700 nm with each of such AR coatings mostly exceeds that of all-oxide system in the shorter wavelength region. With scanning scratch test the scratch resistance of the coatings have been determined relative to each other.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Sven Laux, Norbert Kaiser, Hansjoerg S. Niederwald, Michael Mertin, Henrik Ehlers, and Detlev Ristau "Broadband antireflection coatings deposited with ion-assisted evaporation", Proc. SPIE 3738, Advances in Optical Interference Coatings, (7 September 1999); https://doi.org/10.1117/12.360066
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