Constrained optimization of band-edge filter matching layers

Ronald R. Willey

doi:10.1117/12.360127

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7 September 1999 Constrained optimization of band-edge filter matching layers

Ronald R. Willey

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Proceedings Volume 3738, Advances in Optical Interference Coatings; (1999) https://doi.org/10.1117/12.360127
Event: Optical Systems Design and Production, 1999, Berlin, Germany

Abstract

A constrained optimization design procedure is described which gives good control of the spectral position of a filter edge and simultaneously optimizes pass band transmittance. The underlying principle of our previous study was to use constant level monitoring and position that constant layer termination photometric level for the least sensitivity to photometric and other layer termination errors. Additional layers are needed between the substrate and the periodic stack to bring the layer termination to the ideal level and also provide the antireflection coating of the pass band of interest. The requirement can be stated as: the preliminary layers must move the reflectance phase at the monitoring wavelength from that of the substrate to that of the start of the periodic stack needed for CLM. The constraints are that the magnitude and phase values at the end of the deposition of the preliminary layers satisfy these specific requirements. The constrained optimization can vary both the pre- and post-periodic matching layers while attempting to meet the transmittance targets and simultaneously satisfy the constraints. When this is done, the resulting design has optimized transmittance and satisfies the required constant level optical monitoring conditions for the most reproducible result in production.

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Ronald R. Willey "Constrained optimization of band-edge filter matching layers", Proc. SPIE 3738, Advances in Optical Interference Coatings, (7 September 1999); https://doi.org/10.1117/12.360127

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