Optical properties of VO2 thin films in their dielectric and metallic states

Christophe Petit; Jean Marc Frigerio

doi:10.1117/12.360070

Translator Disclaimer

7 September 1999 Optical properties of VO2 thin films in their dielectric and metallic states

Christophe Petit, Jean Marc Frigerio

Author Affiliations +

Proceedings Volume 3738, Advances in Optical Interference Coatings; (1999) https://doi.org/10.1117/12.360070
Event: Optical Systems Design and Production, 1999, Berlin, Germany

Abstract

Thermochromic VO₂ thin films have been deposited by reactive RF cathodic sputtering, using a V₂O₄ target. They were characterized by XRD, AFM and optical measurements. We show that the microstructure influences the optical response of the material, i.e. its hysteresis cycle as well as the values of the optical constants n and k. We performed ellipsometric measurements from the UV to the far IR, combing two kinds of ellipsometers, in both the dielectric and the metallic states. The n and k constants are described by a dispersion law based on Lorentz oscillators, and an additional Drude contribution for the metallic state. The results are confirmed by XPS analysis. Contrary to the semiconductor phase, the metallic phase appears to be strongly dependent of the microstructure, as far as the optical response is concerned.

Citation Download Citation

Christophe Petit and Jean Marc Frigerio "Optical properties of VO2 thin films in their dielectric and metallic states", Proc. SPIE 3738, Advances in Optical Interference Coatings, (7 September 1999); https://doi.org/10.1117/12.360070

ACCESS THE FULL ARTICLE