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6 September 1999 Surface roughness and subsurface damage characterization of fused silica substrates
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Abstract
The surface microtopography and subsurface damage of fused silica have been examined after different stages of the manufacturing process. Results are presented of etching experiments and measurements performed by white light interferometry, atomic force microscopy and total light scattering.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Andreas Wuttig, Joerg Steinert, Angela Duparre, and Horst Truckenbrodt "Surface roughness and subsurface damage characterization of fused silica substrates", Proc. SPIE 3739, Optical Fabrication and Testing, (6 September 1999); https://doi.org/10.1117/12.360168
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