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7 May 1999 Fabrication of composite sol-gel optical channel waveguides by laser writing lithography
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Proceedings Volume 3740, Optical Engineering for Sensing and Nanotechnology (ICOSN '99); (1999) https://doi.org/10.1117/12.347820
Event: Optical Engineering for Sensing and Nanotechnology (ICOSN '99), 1999, Yokohama, Japan
Abstract
We report the preparation of high optical quality sol-gel waveguide films made from high titanium content organically modified silane (ORMOSIL) and the fabrication of optical channel waveguides in the deposited sol-gel films. The waveguide films were deposited on a solid substrate (such as silicon) by spin-coating and low temperature baking, and the channel waveguides were fabricated using laser writing and reactive ion etching (RIE). The properties of the sol-gel waveguide films were characterized using atomic force microscopy (AFM), ellipsometry, and UV-visible spectroscopy (UV-VIS). AFM and ellipsometry results showed that a dense and porous-free waveguide film could be obtained at the heat treatment temperature of 100 degrees celsius. The influence of the RIE parameters including O2 content, rf power, and pressure on etching rate of the sol-gel waveguide films have been investigated. After a number of exploratory experiments, suitable etching parameters for the case of photoresist mask layer have been obtained.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Wenxiu Que, Yan Zhou, Yee Loy Lam, Yuen Chuen Chan, Yuwen Chen, Seng Lee Ng, ChinYi Liaw, and Chan Hin Kam "Fabrication of composite sol-gel optical channel waveguides by laser writing lithography", Proc. SPIE 3740, Optical Engineering for Sensing and Nanotechnology (ICOSN '99), (7 May 1999); https://doi.org/10.1117/12.347820
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