7 May 1999 Improvement of precision in the analysis of a lateral shearing interferogram using integration
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Proceedings Volume 3740, Optical Engineering for Sensing and Nanotechnology (ICOSN '99); (1999) https://doi.org/10.1117/12.347763
Event: Optical Engineering for Sensing and Nanotechnology (ICOSN '99), 1999, Yokohama, Japan
Abstract
In the method for obtaining an error in a shape under test using the integration from a lateral shearing interferogram, it is assumed that the lateral shear of the shape is so small that the interferogram pattern is considered to be representative of the wavefront slope. To obtain the shape, the slope is analyzed by integration. When the lateral shear of the wavefront is not small, an accurate shape cannot be obtained. Furthermore, the analyzed area of the wavefront is limited by the amount of shear, and the whole area cannot be obtained by this method. A method for reconstructing the whole accurate shape from the wavefront analyzed using the integration process is presented in this paper. In a computer simulation to investigate the efficacy of the method, the reconstructed shape agreed with the original shape error.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Seiichi Okuda, Takashi Nomura, Kazuhide Kamiya, Hiroshi Miyashiro, Kazuo Yoshikawa, Hatsuzo Tashiro, "Improvement of precision in the analysis of a lateral shearing interferogram using integration", Proc. SPIE 3740, Optical Engineering for Sensing and Nanotechnology (ICOSN '99), (7 May 1999); doi: 10.1117/12.347763; https://doi.org/10.1117/12.347763
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