7 May 1999 Microscope for measurement of discontinuous deep microstructure topography
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Proceedings Volume 3740, Optical Engineering for Sensing and Nanotechnology (ICOSN '99); (1999) https://doi.org/10.1117/12.347846
Event: Optical Engineering for Sensing and Nanotechnology (ICOSN '99), 1999, Yokohama, Japan
Abstract
The paper describes the new microscope for accurately measuring the three-dimensional surface topography of deep and discontinuous microstructures, which is based on two- wavelength phase-shifting interferometry (PSI) and data analysis. The microscope mainly consists of dual-path interference microscopic optical system, CCD image sampling system, control system and data analysis/processing. The related techniques include five-step PSI technique, the generalized two-wavelength interferometry (TWI) and a new data analysis/processing technique. The depth resolution of the microscope is 0.5 nm, the depth measuring accuracy is better than 1.3 nm. When the 20X microscope objective (NA equals 0.4) is used, the spatial resolution of the microscope is about 0.5 micrometer, the field is about (phi) 1.325 mm.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Mingbao Zhou, Mingbao Zhou, } "Microscope for measurement of discontinuous deep microstructure topography", Proc. SPIE 3740, Optical Engineering for Sensing and Nanotechnology (ICOSN '99), (7 May 1999); doi: 10.1117/12.347846; https://doi.org/10.1117/12.347846
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