Translator Disclaimer
28 April 1999 Assessment of a hypothetical road map that extends optical lithography through the 70-nm technology node
Author Affiliations +
Proceedings Volume 3741, Lithography for Semiconductor Manufacturing; (1999) https://doi.org/10.1117/12.346877
Event: Microelectronic Manufacturing Technologies, 1999, Edinburgh, United Kingdom
Abstract
This work discusses routes to extend optical lithography to the 70 nm technology node using proper selection of masks, mask design including choice of optical proximity correction (OPC), exposure tool, illuminator design, and resists design to do imaging process integration. The goal of this integration is to make each component of the imaging system work to the best benefit of the other imaging components so as to produce focus-exposure process windows large enough to use in a manufacturing environment.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
John S. Petersen, Martin McCallum, Nishrin Kachwala, Robert John Socha, J. Fung Chen, Thomas L. Laidig, Bruce W. Smith, Ronald L. Gordon, and Chris A. Mack "Assessment of a hypothetical road map that extends optical lithography through the 70-nm technology node", Proc. SPIE 3741, Lithography for Semiconductor Manufacturing, (28 April 1999); https://doi.org/10.1117/12.346877
PROCEEDINGS
17 PAGES


SHARE
Advertisement
Advertisement
Back to Top