Visit My Account to manage your email alerts.
Characterization, development, and implemenation of multiplaten in-situ rate monitor (ISRM) control for chemical mechanical planarization in ASIC manufacturing
Practical issues in the deployment of a run-to-run control system in a semiconductor manufacturing facility
Methodology to improve mean time between clean and decrease defectivity on LAM TCP 9600 by using self-excited electron plasma resonance spectroscopy
Critical dimension and oxide damage control during poly/polycide etching on a TCP9400SE using the SEERS plasma diagnostic system
Integration of factory simulation with TCAD process and device simulation within a total TCAD approach to DFM
Characterization of metal profile notching as a result of electron shading in a high-density plasma etcher