23 April 1999 Methodology to improve mean time between clean and decrease defectivity on LAM TCP 9600 by using self-excited electron plasma resonance spectroscopy
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Proceedings Volume 3742, Process and Equipment Control in Microelectronic Manufacturing; (1999) https://doi.org/10.1117/12.346236
Event: Microelectronic Manufacturing Technologies, 1999, Edinburgh, United Kingdom
Abstract
This paper investigates the use of plasma diagnostic monitoring to implement the right methodology to improve MTBC (Mean Time Between Clean) and decrease the defectivity on the LAM TCP9600. A global approach was used to reach our MTBC and defectivity goals by working on the main chamber wet clean procedures, on the conditioning procedures, on the pumping conditions and on the gas lines. The different partners involved were ST Microelectronics, LAM RESEARCH, ALCALEL, MILLIPORE and ASI.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Gerard Petit, Gerard Petit, } "Methodology to improve mean time between clean and decrease defectivity on LAM TCP 9600 by using self-excited electron plasma resonance spectroscopy", Proc. SPIE 3742, Process and Equipment Control in Microelectronic Manufacturing, (23 April 1999); doi: 10.1117/12.346236; https://doi.org/10.1117/12.346236
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