23 April 1999 Statistical approach to linewidth control in a logic fab
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Proceedings Volume 3742, Process and Equipment Control in Microelectronic Manufacturing; (1999) https://doi.org/10.1117/12.346252
Event: Microelectronic Manufacturing Technologies, 1999, Edinburgh, United Kingdom
Abstract
We designed an adaptive line width controller specially tailored to the needs of a highly diversified logic fab. Simulations of different controller types fed with historic CD data show advantages of an SPC based controller over a Run by Run controller. This result confirms the SPC assumption that as long as a process is in statistical control, changing the process parameters will only increase the variability of the output.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Michael Pitter, Michael Pitter, Bernhard Doleschel, Bernhard Doleschel, Ludwig Eibl, Ludwig Eibl, Erwin Steinkirchner, Erwin Steinkirchner, Andreas Grassmann, Andreas Grassmann, } "Statistical approach to linewidth control in a logic fab", Proc. SPIE 3742, Process and Equipment Control in Microelectronic Manufacturing, (23 April 1999); doi: 10.1117/12.346252; https://doi.org/10.1117/12.346252
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