Investigation and application of the buried-layer van der Pauw and bar resistors

Keith Findlater; Martin Fallon; Mark Redford

doi:10.1117/12.346922

27 April 1999 Investigation and application of the buried-layer van der Pauw and bar resistors

Keith Findlater, Martin Fallon, Mark Redford

Proceedings Volume 3743, In-Line Characterization, Yield Reliability, and Failure Analyses in Microelectronic Manufacturing; (1999) https://doi.org/10.1117/12.346922
Event: Microelectronic Manufacturing Technologies, 1999, Edinburgh, United Kingdom

Abstract

Sheet resistance measurements are often used as process control monitors and are a key part of resistor measurements for SPICE models. These are normally Ohmic in nature. However it can be seen that buried layer resistors are strongly affected by the applied bias conditions in a similar mode to JFET operation. Two standard resistor structures have been studied to investigate this effect: the bar resistor and the van der Pauw, 2D and 3D-device simulation have been used to model the self-modulation and to produce recommendations for optimized routine measurement.

Citation Download Citation

Keith Findlater, Martin Fallon, and Mark Redford "Investigation and application of the buried-layer van der Pauw and bar resistors", Proc. SPIE 3743, In-Line Characterization, Yield Reliability, and Failure Analyses in Microelectronic Manufacturing, (27 April 1999); https://doi.org/10.1117/12.346922

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