Quantitative Makyoh topography

Zsolt John Laczik

doi:10.1117/12.346908

27 April 1999 Quantitative Makyoh topography

Zsolt John Laczik

Proceedings Volume 3743, In-Line Characterization, Yield Reliability, and Failure Analyses in Microelectronic Manufacturing; (1999) https://doi.org/10.1117/12.346908
Event: Microelectronic Manufacturing Technologies, 1999, Edinburgh, United Kingdom

Abstract

When a collimated beam of light is reflected by an approximately flat, mirror polished object and a screen is placed in the reflected beam some distance away for the object, a 'mirror image' or Makyoh topogram of the object is formed on the screen. For objects with surface height variations, the topogram will not have a uniform intensity distribution, but even small height variations will show up strongly amplified as dark or bright patches/lines. Makyoh topography has now been used for a number of years as a sensitive tool for the inspection of mirror polished surfaces, and in particular, semiconductor wafer surfaces. The main drawbacks of conventional Makyoh topography are: 1) Ambiguity of interpretation because almost identical Makyoh topograms can result from an object with some given surface height profile and constant reflectivity, an object with constant surface height and a given non-uniform reflectivity profile, or an object with both height variations and a non- uniform reflectivity profile. 2) Lack of quantitative interpretation, for example surface height values cannot be obtained from the contrast in conventional topograms.

Citation Download Citation

Zsolt John Laczik "Quantitative Makyoh topography", Proc. SPIE 3743, In-Line Characterization, Yield Reliability, and Failure Analyses in Microelectronic Manufacturing, (27 April 1999); https://doi.org/10.1117/12.346908

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