25 August 1999 Auxiliary pattern generation to cancel unexpected images at sidelobe overlap regions in attenuated phase-shift masks
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Proceedings Volume 3748, Photomask and X-Ray Mask Technology VI; (1999) https://doi.org/10.1117/12.360193
Event: Photomask and X-Ray Mask Technology VI, 1999, Yokohama, Japan
Abstract
An automated method has been developed to generate auxiliary patterns to cancel unexpected images formed by attenuate phase-shift masks. This method consists of checking the area where sidelobes overlap and generating the auxiliary patterns. The sidelobes are approximated by polygons and the degree of overlap is checked. Taking overlap degree information into account, auxiliary pattern size is defined and automatically generated. Practicality of this method is confirmed by application to a medium-scale layout of 105 patterns.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kyoji Nakajo, Junya Sakemi, Hiroshi Fukuda, Tsuneo Terasawa, Norio Hasegawa, Eiji Tsujimoto, "Auxiliary pattern generation to cancel unexpected images at sidelobe overlap regions in attenuated phase-shift masks", Proc. SPIE 3748, Photomask and X-Ray Mask Technology VI, (25 August 1999); doi: 10.1117/12.360193; https://doi.org/10.1117/12.360193
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