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25 August 1999 Comparative evaluation results of CMS replacement resist for e-beam reticle fabrication
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Proceedings Volume 3748, Photomask and X-Ray Mask Technology VI; (1999) https://doi.org/10.1117/12.360201
Event: Photomask and X-Ray Mask Technology VI, 1999, Yokohama, Japan
Abstract
Looking for a CMS replacement resist is an urgent assignment for e-beam reticle fabrication, which enables us to maintain flexibility of reticle fabrications. CMS-EX series was discontinued in 1995, and its stored resin will be used up completely sooner in this year 1999. We then tried to find a replacement resist, and examined commercially available resist SEL-N1000, SEL-N1100 and ZEN4400. We studied their behavior to post-spin baking temperature respectively, in order to bring out their potential, by investigating isolated clear pattern fidelity in details as it was the most tough one to make by a negative-working resist. This paper describes our comparative evaluation results of commercially available negative-working resists to determine a CMS-EX-S replacement for e-beam reticle fabrication.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hideo Kobayashi, Takao Higuchi, Keishi Asakawa, Yasunori Yokoya, and Tetsuya Wada "Comparative evaluation results of CMS replacement resist for e-beam reticle fabrication", Proc. SPIE 3748, Photomask and X-Ray Mask Technology VI, (25 August 1999); https://doi.org/10.1117/12.360201
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