Comparison of mulitpass gray strategy and conventional writing method

Ichiro Kagami; Masaaki Koyama; Hiroichi Kawahira

doi:10.1117/12.360205

25 August 1999 Comparison of mulitpass gray strategy and conventional writing method

Ichiro Kagami, Masaaki Koyama, Hiroichi Kawahira

Proceedings Volume 3748, Photomask and X-Ray Mask Technology VI; (1999) https://doi.org/10.1117/12.360205
Event: Photomask and X-Ray Mask Technology VI, 1999, Yokohama, Japan

Abstract

A small design address size on 1 X below 5 nm is one of the requirement for 0.18 micrometers masks for critical layers. To realize the small address size on raster scan electron beam systems, the improvement of throughput is a key issue. So, multipass gray (MPG) writing strategy was introduced for the 0.18 micrometers generation masks. Characteristics of MPG writing strategy are that (1) using larger writing address unit than the input data address and (2) gray level writing to modulate an electron beam (EB) dosage. In this paper, the evaluation of critical dimension (CD) controllability for the MPG writing strategy will be presented for a positive EB resist and a chemically amplified negative EB resist with a Cr dry etch process. Comparisons of such as corner rounding and throughput between MPG and conventional writing method is also reported.

Citation Download Citation

Ichiro Kagami, Masaaki Koyama, and Hiroichi Kawahira "Comparison of mulitpass gray strategy and conventional writing method", Proc. SPIE 3748, Photomask and X-Ray Mask Technology VI, (25 August 1999); https://doi.org/10.1117/12.360205

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