25 August 1999 Improvement of OPC data processing for photomask fabrication
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Proceedings Volume 3748, Photomask and X-Ray Mask Technology VI; (1999) https://doi.org/10.1117/12.360196
Event: Photomask and X-Ray Mask Technology VI, 1999, Yokohama, Japan
Abstract
For common approach for low k1-factor process, or just shrink LSI chip size, Optical Proximity effect Correction (OPC) has been getting popular. Though only the OPC effect tends to be discussed at design or wafer process stages, the OPC data processing or OPC photomask writing should be also discussed. Through many experiments with fabricated OPC reticles using many kinds of OPC data, the pursuit of reasonable OPC has been continuing. Then practical design grid for reasonable OPC that will improve data processing, output volume and photomask writing time keeping with regardful OPC effect is discussed.
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Nobuhito Toyama, Nobuhito Toyama, Hiroyuki Miyashita, Hiroyuki Miyashita, Kouji Ishida, Kouji Ishida, "Improvement of OPC data processing for photomask fabrication", Proc. SPIE 3748, Photomask and X-Ray Mask Technology VI, (25 August 1999); doi: 10.1117/12.360196; https://doi.org/10.1117/12.360196
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